Vapor sublimation traps are widely used in silicon nitride LPCVD and Titanium nitride LPCVD processes where significant amount of NH4Cl byproducts have been observed in the foreline. The Vapor Sublimation Trap draws in effluent vapors and solidifies them before they have a chance to backstream to the reaction chamber, contaminating and hazing your wafers. It also prevents gases from entering and damaging your vacuum pump.
Vapor Sublimation Process Traps are available with the following options.
Configuration Option |
Option Code |
---|---|
Vapor Sublimation Process Trap | WCTRAP |
Port Size | |
NW50 | 050 |
NW80 | 080 |
NW100 | 100 |
Configuration | |
Angle (NW50 & NW100) | A |
Heatable Angle (NW80 only) | H |
Inline (NW80 & NW100) | N |
Flange | |
ISO-KF (NW50 only) | K |
ISO-MF (NW80 and NW100 only) | M |
Body Size | |
6 inch | 6 |
8 inch | 8 |
Seal Type | |
Viton® | V |
Silicone | S |
Water Fittings | |
Straight | QRS |
Elbow | QRL |
3/8 in. Tube | None |