The DI-Solverâ„¢ NH3 is a compact, stand-alone system designed to provide dissolved ammonia water for use in rinsing processes in the semiconductor industry. With Semiconductor 3D IC architectures using new materials like Cu-Co and Si-SiGe, the ability to wet clean with precise alkaline chemistries is growing in frequency and importance. The system is specifically designed to provide optimal cleaning capability at a given conductivity. The alkaline chemistry of dissolved ammonia provides ESD protection during rinsing, particle lift-off, and residual particle removal. It also prevents corrosion of metal interfaces, which is a common problem in semiconductor manufacturing. The system uses closed-loop control to keep conductivity and pressure stable under changing flow conditions. It also monitors and adjusts the NH4OH concentration to deliver the desired level of dissolved ammonia.
MKS' Di-Solver NH3 leverages the established and proven architecture of LIQUOZON® VariO3 Ozonated Water Delivery System, integrating high purity standard materials and safety features in a rugged system to meet the demands of advanced technology manufacturing.