• Power Architecture
  24 kW RF power output
  ±1% accuracy to power setting
  DC boost power regulation
• Process
  NF3 species for chamber clean
  Mixed gas species capable
  Supports NF3, O2, N2, Ar
• Maintenance
  Plasma Electrolytic Oxide plasma block coatings for extended block life, lower operating expenses

The split power train design allows for greater flexibility in chamber installations and easy access for servicing without breaking chamber vacuum. The RF powertrain remains coupled to the toroidal applicator head for greater plasma stability while the DC rectified power Product Features supply provides a SEMI F47 compliant source of power to the applicator head. A new magnetics design combined with new power boost electronics reduces power losses, enhances ignition repeatability, and increases plasma stability, resulting in improved reliability and repeatable performance.

Equipped with EtherCAT® communication protocols, the RPS-CH24P1 streams key parametric data enabling ontool or in-fab diagnostics. The actively cooled MKS lowfield toroidal applicator and proprietary, high purity Al2O3 coating deliver extremely long plasma applicator lifetimes to reduce fab operation expenses. When the unit does require routine maintenance, servicing the plasma block applicator can be accomplished without removing the power electronics, reducing service times.