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Remote Plasma Sources for Clean Applications
Thin film deposition generates by-products which adhere to process chamber walls, resulting in potential process and product contamination. Our Toroidal Remote Plasma Sources for NF3 and fluorine-based gases clean deposits from CVD, PVD, PE-ALD, and ALD process chambers. With high dissociation rates and a proprietary plasma block design, our remote plasma sources provide increased process throughput and repeatable process results. Equipped with EtherCAT® communication to enable data streaming, our remote plasma sources support Industry 4.0.
Paragon® 8.0 slm NF3 Flow Intelligent Remote Plasma Source
- Up to 8 slm NF flow, in a compact size enables faster clean times
- Best in Class dissociation (>95%) for efficient uniform cleaning results
- EtherCAT intelligent data reporting for faster, tighter device operation
RPS-CH24P1 Remote Plasma Source for High Flow Applications
- Compact split applicator power design provides easy integration to OEM process chambers
- Increased Fluorine radical output shortens clean time cycles
- EtherCAT® communication enables fast, reliable data streaming and unit control
RPS-CM12P1 Remote Plasma Source for ALD, CVD and PVD Chambers
- Compact design enables easy integration to OEM process chambers
- Increased Fluorine radical output shortens clean time cycle
- EtherCAT® communications provides fast, reliable, data streaming and unit control
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