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Helium Wafer Cooling Pressure Controllers
MKS offers state of the art pressure and flow control solutions that allow for highly effective backside wafer cooling, improving yield and throughput.
PPCA High Performance Integrated Pressure Controllers
- Backside wafer cooling
- Fast response to set point with minimal overshoot
- Metal-sealed, cleanroom manufactured units meet critical high purity application needs
PPCMA Downstream Pressure Controller with Mass Flow Meter
- Fast response to set point with minimal overshoot
- DeviceNet™ or EtherCAT® communications
- Integral Baratron® capacitance manometer technology
640B Integrated Absolute Pressure Controllers
- Integrated Baratron® capacitance manometer technology
- Full Scale ranges as low as 10 Torr for low pressure processes
- Can be used with upstream or downstream controller applications
649B Downstream Pressure Controllers with Mass Flow Meter
- Integral Baratron® capacitance manometer technology
- Patented mass flow sensor for exceptional long-term accuracy and zero stability
- Metal-sealed, cleanroom manufactured for critical high purity applications
PDPCA Dual-zone Pressure Controllers with Mass Flow Meter
- Available with EtherCAT® or DeviceNet™ communications
- Less plumbing and cabling required
- Pressure measurement accuracy of ±0.5% of set point
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