O3CS Compact Ozone System
Overview
The O3CS compact ozone system uses Grade 6 oxygen to generate pure ozone, enabling the creation of high quality thin films for the semiconductor industry. Ozone reacts with a wide range of precursor gases to generate oxide films such as Al2O3, ZrO2, HFO2 & La2O3 via Atomic Layer Deposition (ALD). MKS’ patented ozone generator cell technology, combined with high purity wetted materials and dopant gas levels far below those required for other ozone generators, creates ultra-clean, high concentration ozone resulting in improved thin film densities and product yield.
Note: the O3MEGA has been rebranded as the O3CS.
- High quality thin films created using Grade 6 gas
- Configurable to adapt ozone output to specific process steps such as deposition of Al2O3
- Clean, safe alternative to conventional chemical processing
Products
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O3CS O3CS Compact Ozone System |
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Specifications
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Ozone Output25-225 g/hr (configuration dependent)
at 25 psi ozone delivery pressure and 17°C cooling water -
Ozone ConcentrationUp to 20 wt% (300 g/m3) (configuration dependent)
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Flow Rate0.5-20 slm (configuration dependent)
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Operating Temperature20-40°C (68-104°F)
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Nominal Cell Pressure (Delivery)0.7-3.1 bargauge (10-45 psig)
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Control InterfaceRemote operation, Discrete analog I/O 25 pin D-sub, DeviceNet®, Ethernet Modbus TCP
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Voltage Requirements208 VAC
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Current RequirementsNominal current 2-10A max (configuration dependent)
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Frequency50/60 Hz
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Phase3 phase and GND (no neutral)
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Dimensions482 x 429 x 267 mm (19 x 16.89 x 10.5 in)
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Weight40 kg (88 lb) (approximate - configuration dependent)
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ComplianceSEMI S2-0302, SEMI F47, UL 61010-1, CAN/CSA-61010-1
Features
Resources
Literature
- O3CS Compact Ozone System (369.3 kB, PDF)
Drawings & CADs
- O3CS Ozone Generator Dimensional Drawing (1.2 MB, PDF)
Technical Papers
- Ozone Applications for Atomic Layer Processing (1.5 MB, PDF)
Ultra-High Velocity