The O3CS compact ozone system uses Grade 6 oxygen to generate pure ozone, enabling the creation of high quality thin films for the semiconductor industry. Ozone reacts with a wide range of precursor gases to generate oxide films such as Al2O3, ZrO2, HFO2 & La2O3 via Atomic Layer Deposition (ALD). MKS’ patented ozone generator cell technology, combined with high purity wetted materials and dopant gas levels far below those required for other ozone generators, creates ultra-clean, high concentration ozone resulting in improved thin film densities and product yield.
Note: the O3MEGA has been rebranded as the O3CS.
Features
Available in either a standalone form or integrated with up to 4 channel units into a system rack, each unit delivers a precise ozone concentration to the equipment chamber. The O3CS ozone gas delivery system incorporates MKS field-proven modular ozone generation technology, an integrated ozone concentration monitor, flow control for both O2 and dopant gas species, and an electronic pressure controller.
- Compact ozone delivery subsystem easily integrates with the chamber tool
- Concentrations up to 20 wt% (300 g/m3)
- Flow rates from 0.5 to 20 slm
- Patented ozone cells with advanced cooling
- Full electronic control including closed loop ozone concentration control with integrated process monitor
- Mass flow control for O2 and dopant gas
- Electronic pressure control for stable operation during process point
Resources
Literature
O3CS Compact Ozone System(369.3 kB, PDF)
Drawings & CADs
O3CS Ozone Generator Dimensional Drawing(1.2 MB, PDF)
Technical Papers
Ozone Applications for Atomic Layer Processing(1.5 MB, PDF)