The AX8575 stand-alone ozone gas delivery system is designed to provide high flow, high concentration, ultra clean ozone generation and delivery. This unit has the highest flexibility to meet the ever changing needs of the semiconductor industry. The AX8575 is a fully integrated, high output ozone gas delivery system specifically designed for use with an increasing number of semiconductor process applications such as Atomic Layer Deposition (ALD), Chemical Vapor Deposition (CVD), Tetraethyl Orthosilicate (TEOS)/Ozone CVD (HDSACVD), photoresist strip, wafer cleaning, contaminant removal, and oxide growth. The system can be configured as a multi-channel system delivering ozone for up to 4 channels supporting multiple chambers or multiple tools. The AX8575 is available with an in-rack chiller option for high concentrations. Flow rates of up to 40 slm and concentrations up to 350g/Nm3 can be achieved depending on the configuration of the system.