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Remote Plasma Sources for Process Applications
MKS remote plasma sources deliver high density reactive radicals improving on-wafer cleaning and deposition throughput. Solutions consist of a fully integrated, self-contained unit designed for quick on-chamber installation providing fast, reliable plasma ignition of O2, Hydrogen and Nitrogen gases in a customer configurable package. All solutions are equipped with intelligent power control and EtherCAT® diagnostics supporting Industry 4.0.
R*evolution® Remote Plasma Source
- Integrated, self-contained unit designed for on-chamber installation
- Quartz plasma applicator, high density for oxygen species
- Up to 6 kW of plasma power
High Power Microwave Plasma System
- High power microwave plasma system @ 2.45 GHz
- Advanced closed loop power control with <1% output accuracy variation
- Instant plasma ignition
High Power Microwave Plasma Source
- Higher productivity compatible with 6kW MKS microwave generator
- High power technology enables processes with high output of H* radicals
- Wider operating range and higher flow capability for higher throughput
Chemical Downstream Plasma Source
- Sapphire or quartz discharge tubes for Fluorine and non-fluorine chemistries
- Patented conductively-cooled design with high power and throughput
- Easy integration
AX2600 and AX2700 Microwave Plasma Subsystems
- 3 kW Power
- Accurate power measurement, closed loop control and automatic plasma tuning
- Precise microwave generator with closed loop control power regulation
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