Vision 2000-C™ XD & Vision 2000-E™ XD High Sensitivity RGAs for Multi-pressure & CVD/ALD Processes

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vision 2000-c and e xd high sensitivity multi-pressure, cvd/ald rga

Overview

The Vision 2000-C™ XD and Vision 2000-E™ XD systems allow seamless monitoring of a wide range of semiconductor applications, including the complete ALD, CVD, and Etch processes, from base vacuum to process pressures up to 700 Torr. Both systems incorporate patented V-lens™ technology, taking the proven performance of the Vision 2000-C and Vision 2000-E systems to a new level of sensitivity and reliability, previously unachievable with conventional quadrupole mass spectrometry systems (QMS).

In situ monitoring during chamber clean, passivation and deposition
Up to 10 times increased sensitivity at lower masses (<15ppb)
Reliable distinction between gases and background
UniBloc™ fast-response inlet valve for sampling at background and process pressures
Integration with a wide range of ALD, CVD, and Etch tools

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Products

		Compare	Description	Compatibility	sortOrder	rankScore	ranking	Drawings, CAD & Specs		Mass Range	Minimum Detectable Concentration	Mass Stability	Type	Analyzer Housing Base Pressure	Availability	Featured Item	Price		Brand
		VISION-2000-C-XD CVD or Etch Process Monitor, High Sensitivity, 1-300 amu, Multi-pressure Show	VISION-2000-C-XD CVD or Etch Process Monitor, High Sensitivity, 1-300 amu, Multi-pressure	UNIVERSAL	0.0	1.0	0.0		0.0	1 - 300 amu	<15 ppb specified with Argon or Nitrogen	Better than ±0.1 amu over 8 hours	Residual Gas Analyzer	Better than 5e^-9 Torr after bakeout	Show
		VISION-2000-E-XD CVD or Etch Process Monitor, High Sensitivity, 1-200 amu, Multi-pressure Show	VISION-2000-E-XD CVD or Etch Process Monitor, High Sensitivity, 1-200 amu, Multi-pressure	UNIVERSAL	0.0	1.0	0.0		0.0	1 - 200 amu	<15 ppb specified with Argon or Nitrogen	Better than ±0.1 amu over 8 hours	Residual Gas Analyzer	Better than 5e^-9 Torr after bakeout	Show

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Specifications

Mass Range

1-300 amu
Ion Source

High conductance closed ion source
Filaments

Independently replaceable twin Tungsten filaments
Mass Filter

Double filter (1-inch "RF only" pre-filter with 4-inch main filter)
Detector

Dual (Faraday and secondary electron multiplier)
Maximum Analyzer Operating Pressure

1e-3 Torr at the ion source inlet (standard), higher pressure optional
Minimum Detectable Partial Pressure

<2e-11 Torr (for total pressures <1e-4 Torr on baseline inlet)
Minimum Detectable Concentration

<15ppb specified with Argon or Nitrogen
Mass Stability

Better than ±0.1 amu over 8 hours
Resolution

Better than 10% valley between peaks of equal height throughout the mass range
Base Pressure Range

Ion source at maximum pressure at 1 mTorr, 10 mTorr or 100 mTorr
Process Pressure Range

Ion source at maximum pressure at 10 mTorr, 100 mTorr, 500 mTorr, 1.5 Torr, 5 Torr, 10 Torr, 40 Torr, 100 Torr or 700 Torr
Mounting Flange

DN35CF (70mm/2.75 inches OD) Conflat® flange
Vacuum Hardware

60 l/s turbomolecular pump with high conductance analyzer housing, inlet system, UniBloc™ inlet, automated vacuum control (RVC) completely interlocked and integrated
Backing Vacuum System

Standard: Connected to the tool foreline pump via Surge Protect assembly with a KF16 fitting
Optional: Independent chemically resistant, dry diaphragm pump with KF16 fitting for connecting the exhaust to a suitable scrubber system
Bakeout Temperature and Bakeout Jacket

Included for 180°C bakeout

Operating Temperature

Electronics: 10-40°C
Weight

Control Module: 1.7 kg
Mechanical Support

Optional stands and brackets are available
Mobile RGA Platform

Optional RGA trolley to improve versatility (footprint 18x24 inches, 455x604mm)
Pneumatics

60-80 psig CDA
Power Requirements

88-264 VAC, 47/63 Hz, 600 Watts
Maximum Operating Conditions

80% RH (non condensing)
LED Status Indication

Interlock status, filament emission, SEM, power and communications
I/O Capability

4 analog inputs and 2 outputs (plus 1 dedicated gauge input). Optional support for a large number of both analog and digital inputs and outputs, including relay control
Other Facilities

Leak check headset socket, external filament trip socket, instrument reset
Software

Process Eye® Professional fully network compatible control platform generating under 32bit or 64bit Microsoft® Windows® xP, Vista, Server 2008 or Windows 7* (*recommended)
Communication

Ethernet CAT-5e
PC Requirements

Intel® Pentium IV® or AMD Athlon xP 1.2GHz, 1GB RAM, 120 GB hard drive, dependent upon total number of sensors on the computer and the operating system in use. Multi-sensor installation may require higher specifications.
Simultaneous Multi-Sensor

Process Eye Professional client/server configuration offers flexible multi-sensor operation.
Shipping Weight

44 lbs (20 Kg)
Compliance

Compliant to RoHS Directive 2002/95/EC (control unit)

Features

Accessories

Compatible Software

Description	Compatibility	Avail.	Price
PROCESS-EYE-PROFESSIONAL Process Monitoring Software, Residual Gas Analyzer, Process Eye™ Professional	UNIVERSAL	Show
512-000/D Gas Analyzer Software, EasyView, Residual Gas	UNIVERSAL	Show	$721
TOOLWEB-RGA Chamber Monitor Software, Residual Gas Analyzer, TOOLweb®	UNIVERSAL	Show