Vacuum Process and Chamber Environment Monitors
Our process monitors are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.
Vision 2000-A RGA for ALD & CVD
- Modular UniBloc inlet with all metal seals and field serviceable parts
- Temperature inlet up to 200°C (consult the factory for models up to 300°C)
- Direct coupling for a sample transfer tube
Vision 2000-A XD High Sensitivity RGA for ALD & CVD
- Modular UniBloc inlet with all metal seals and field-serviceable parts
- V-lens ion optics technology
- Temperature inlet, up to 200°C (consult the factory for models up to 300°C)
Vision 2000-B™ Vacuum Baseline RGA for Process Tools
- Monitor vacuum pumpdown, baseline, and leakback conditions
- 100 amu standard mass range with 200 amu or 300 amu options
- Process Eye™ Professional or optional TOOLweb® RGA software
Vision 2000-C™ & E™ RGAs for Multi-pressure & CVD/ALD Processes
- Continuous in situ monitoring of CVD and etching processes
- Baseline monitoring for air leaks and background contamination
- Includes Process Eye™ Professional RGA software
Vision 2000-C™-E™ XD High Sensitivity RGAs for Multi-pressure & CVD/ALD
- In situ monitoring during chamber clean, passivation and deposition
- Up to 10 times increased sensitivity at lower masses (<15ppb)
- Reliable distinction between gases and background
Vision 2000-P™ RGA for Select Pressure & PVD Processes
- ppb level detection of contaminant gases during PVD processes
- Track process gas mixture composition when two gases are utilized
- Vacuum troubleshooting for fast PM recovery
Vision 2000-P™ XD High Sensitivity RGAs for Select Pressure & PVD
- PVD contamination monitoring (inc. hydrocarbons) to sub-ppm levels
- Cleaner baseline and lower noise across the mass scale
- Up to 10 times increased sensitivity at lower masses (<15ppb)
300 mm Resist-Torr Photoresist Detection Monitor for High Pressure Degas
- Detection of photoresist contamination during high pressure (~8 Torr) degas
- Fully automated process monitoring means no operator necessary
- Calculation of PR Index - a measure of photoresist contamination level
300 mm Resist-Torr® XD High Sensitivity Photoresist Detection Monitor
- Detection of photoresist contamination during high pressure (~8 Torr) degas
- Up to 10 times increased sensitivity at lower masses (<15ppb)
- Reliable distinction between gases and background
HPQ3 High Pressure 0.001 Torr Residual Gas Analyzers
- Upper working limit of 0.001 Torr total pressure
- Leak detection of vacuum lines, coolant lines, welds, and seals
- Chamber contaminant monitoring, including hydrocarbons
HPQ3S High Pressure 0.008 Torr Residual Gas Analyzer
- Upper working limit of 0.008 Torr total pressure
- Leak detection of vacuum lines, coolant lines, welds, and seals
- Application validated correction algorithms to compensate for sensitivity variation
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