TEOS Process Traps
Overview
Our TEOS process traps when used as one element of a TEOS Effluent Management Subsystem™, have proven very effective in reducing particulates and increasing uptime. TEOS traps collect TEOS byproducts, preventing them from backstreaming into the furnace and contaminating the pump. In test cases, a greater than 20% reduction in particulates has been recorded.
- Improve wafer yields when used as part of a TEOS Effluent Management Subsystem
- Overall yield improvement of 2-3%
- Greater than 20% particle reduction
- Easy cleaning and maintenance of Trap
- Increases uptime, reduces downtime
Products
Configuration Options
TEOS Process Traps are available with the following options.
|
Configuration Option |
Option Code |
|---|---|
| TEOS Process Trap | TSTRP |
| Body Size | |
| 6 in. Body (NW50 & NW80 only) | 6 |
| 8 in. Body (NW80 & NW100 only) | 8 |
| Port Size | |
| NW50 | 050 |
| NW80 | 080 |
| NW100 | 100 |
| Configuration | |
| Angle | A |
| Inline | I |
| Flange | |
| ISO-KF (NW50 only) | K |
| ISO-MF (NW80 and NW100 only) | M |
| Seal Type | |
| Viton® | V |
| Kalrez® | K |
Features
Resources
Literature
- TEOS Trap Datasheet (184.2 kB, PDF)
Ultra-High Velocity